Sven Achenbach

Biography

Sven Achenbach studied Mechanical Engineering at the University of Karlsruhe, Germany. Since 1996, he has worked at the national laboratory LURE in Paris and the German national laboratory Forschungszentrum Karlsruhe (FZK), optimizing microfabrication process technologies. He received his Ph.D. on ultra deep X-ray lithography in 2000.
His research focuses on various aspects of X-ray lithography, including high resolution patterning. It is carried out at various electron storage rings worldwide, in cooperation with several laboratories, universities and companies in Europe, America and Asia.
In 2005, Sven Achenbach assumed the Canada Research Chair in Micro and Nano Device Fabrication at the University of Saskatchewan, Saskatoon, Canada. He is an Adjunct Scientist of Telecommunication Research Labs of Canada (TRLabs) at Innovation Place, Saskatoon.
The main focus of current activities is the erection of SyLMAND, the Synchrotron Laboratory for Micro and Nano Devices, at the new Canadian Light Source (CLS). SyLMAND will be a unique, multi million $ facility in Canada, comprising a dedicated synchrotron beamline and several wet chemical, metrology and preparation labs in a cleanroom environment.
Recent applications of research projects include high performance active and passive RF MEMS devices, biomedical detectors and microdfluidic test patterns as well as optical components such as IR bandpass filters.

Contact

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Research Projects

Canada Research Chair
in Micro and Nano Device Fabrication

Principal Investigator of SyLMAND,
the Synchrotron Laboratory for Micro and Nano Devices,
at the new Canadian Light Source (CLS)

Adjunct Scientist of TRLabs,
Telecommunication Research Labs of Canada,
at Innovation Place, Saskatoon

Research projects cover
- Microfabrication Process Technology
- X-Ray Lithography
- Synchrotron Beamline Layout & Operation
- RF and Microwave MEMS Devices
- Biomedical Applications of Microdevices

Teaching

EE817

Microfabrication by Deep X-Ray Lithography applying Synchrotron Radiation

The course is a multidisciplinary introduction to advanced lithographic microfabrication processes, specifically focusing on X-ray lithography (XRL) using synchrotron radiation and on the LIGA process. Related process technologies and typical applications are discussed in-depth, additionally introducing various processes relevant to academic research and industrial applications in microsystems and microelectronics.

EE471

Introduction to Micro and Nano Technology

The course is a multidisciplinary introduction to the processing of micro- and nano scale structures which are applied in emerging fields of high resolution patterning such as micro/nano electronics, photonics, fluidics. Fundamental technology issues (materials, equipment, fabrication steps, inspection) are discussed. Selected key processes in microfabrication and nanofabrication and its applications/devices are presented.

The course is offered in Term 2 of odd years (next time starting Jan. 2009). It adds to the 3rd/4th year elective courses for the EE program (offered in alternate years), but students from other engineering programs (ME, EP, etc.) and science programs are welcome as well.

In 2009, an optional laboratory component will likely be offered which introduces students to working in a clean room environment, using various fabrication and inspection equipment.

EE392

Electrical Engineering Laboratory II

Laboratory experiments and exercises of design software packages for 3rd-year EE students.
4 Instructors, coordinated by Prof. Johanson.

PHYS155

Introduction to Electricity and Magnetism

The course is mandatory for all first year engineering students. It is taught by 3 instructors.

The first section starts with an introduction to electricity: elementary electric charge, Coulomb’s law, concepts of electric field and electrostatic potential, work, energy and capacitance, and dielectrics.

Graduate Students

Timo Mappes

Darcy Haluzan

Manouchehr Hashemi

Martin Augustin

Brandon Hall

Summer- and International Exchange Students

Selected Journal Papers Copyright Infomation

[27]	D.M. Klymyshyn, M. Boerner, D. Haluzan, E. Gono Santosa, M. Schaffer, S. Achenbach, J. Mohr: "Vertical High-Q RF-MEMS Devices for Reactive Lumped Element Circuits". IEEE Transactions on Microwave Theory and Techniques, 58 (11) (2010) pp. 2976-2986
[26]	D. M. Klymyshyn, T. Mappes, S. Achenbach, A. Kachayev, M. Börner, J. Mohr: "X-ray fabrication of SAW resonators with narrow electrodes in thick high-aspect-ratio polymer templates". Journal of Micromechanics and Microengineering, (2010), online June 2010 (6 pp.), DOI: 10.1088/0960-1317/20/7/075031
[25]	D.T. Haluzan, D.M. Klymyshyn, S. Achenbach, M. Boerner: "Reducing pull-in voltage by adjusting gap shape in electrostatically actuated cantilever and fixed-fixed beams". Micromachines, 1 (2) (2010) pp. 68-81
[24]	S. Achenbach, D. Klymyshyn, B. Michel: "Editorial - Special issue of the 8th International Workshop on High Aspect Ratio Micro Structure Technology, HARMST 2009". Microsystem Technologies, Vol. 16, No. 8-9 (2009): 1285, DOI: 10.1007/s00542-010-1103-z.
[23]	S. Achenbach, V. Subramanian, D. Klymyshyn, G. Wells: "Synchrotron Laboratory for Micro and Nano Devices - Facility Concept and Design". Microsystem Technologies, Vol. 16, Nr. 8-9 (2009) pp. 1293-1298
[22]	V. Subramanian, S. Achenbach, D. Klymyshyn, G. Wells, W. Dolton, V. Nagarkal, C. Mullin, M. Augustin: "In-Situ Diagnostic Capabilities for Beam Position and Beam Intensity Monitoring at SyLMAND". Microsystem Technologies, Vol. 16, Nr. 8-9 (2009) pp. 1547-1551
[21]	M. Hashemi, S. Achenbach, J. Lee, D. Klymyshyn, B. Moazed, R. Stefureac: "Design and Microfabriaction of a Polymer-Membrane based Sub-Micron Scale Electrophoretic Flow Detector for Biomedical Applications". Microsystem Technologies, Vol. 16, Nr. 8-9 (2009) pp. 1563-1567
[20]	S. Achenbach, D. Klymyshyn, T. Mappes, A. Kachayev, V. Subramanian, G. Wells and J. Mohr: "Submicron-Scale Surface Acoustic Wave Resonators Fabricated by High Aspect Ratio X-Ray Lithography and Aluminum Lift-Off". Microsystem Technologies, Vol. 14, Nr. 9-11 (2008) pp. 1715-1719
[19]	D. Haluzan, D. Klymyshyn, M. Börner, S. Achenbach, G. Wells, T. Mappes and J. Mohr: "Stiction Issues and Actuation of RF LIGA-MEMS Variable Capacitors". Microsystem Technologies, Vol. 14, Nr. 9-11 (2008) pp. 1709-1714
[18]	Z. Ma, D. Klymyshyn, S. Achenbach, M. Börner, N. Dambrowsky and J. Mohr: "An Ultra-Deep High-Q Microwave Cavity Resonator Fabricated Using Deep X-Ray Lithography". IEICE Transactions on Electronics, Vol. E90-C, Nr. 12 (2007) pp. 2192-2197
[17]	S. Achenbach, D. Klymyshyn, D. Haluzan, T. Mappes, G. Wells and J. Mohr: "Fabrication of RF MEMS Variable Capacitors by Deep X-Ray Lithography and Electroplating". Microsystem Technologies, Vol. 13, No. 3-4 (2007) pp. 343-348
[16]	S. Achenbach, M. Börner, S. Kinuta, W. Bacher, J. Mohr, V. Saile and Y. Saotome: "Structure Quality in Deep X-Ray Lithography Applying Commercial Polyimide-Based Masks". Microsystem Technologies, Vol. 13, No. 3-4 (2007) pp. 349-354
[15]	T. Mappes, S. Achenbach and J. Mohr: "Process Conditions in X-Ray Lithography for the Fabrication of Devices with Submicron Feature Sizes". Microsystem Technologies, Vol. 13, No. 3-4 (2007) pp. 355-360
[14]	D. Klymyshyn, D. Haluzan, M. Börner, S. Achenbach, J. Mohr and T. Mappes: "High Aspect Ratio Vertical Cantilever RF-MEMS Variable Capacitor". IEEE Microwave and Wireless Component Letters (MWCL), Vol. 17, No. 2 (2007) pp. 127-129
[13]	T. Mappes, S. Achenbach and J. Mohr: "X-Ray Lithography for Devices with High Aspect Ratio Polymer Submicron Structures". Microelectronic Engineering, Vol. 84 (2007) pp. 1235-1239
[12]	Z. Ma, D. Klymyshyn, S. Achenbach and J. Mohr: "Microwave Cavity Resonators Using Hard X-Ray Lithography". Microwave and Optical Technology Letters, Vol. 47, No. 4 (2005) pp. 353-357
[11]	S. Achenbach: "Deep Sub Micron High Aspect Ratio Polymer Structures Produced by Deep X-Ray Lithography". Microsystem Technologies, Vol. 10, No. 6-7 (2004) pp. 493-497
[10]	T. Mappes, S. Achenbach, A. Last, J. Mohr and R. Truckenmüller: "Evaluation of Optical Qualities of a LIGA-Spectrometer in SU-8". Microsystem Technologies, Vol. 10, No. 6-7 (2004) pp. 560-563
[9]	S. Achenbach, T. Mappes and J. Mohr: "Structure Quality of High Aspect Ratio Sub Micron Polymer Structures Patterned at the Electron Storage Ring ANKA". Journal of Vacuum Science & Technology, Vol. B 22, No. 6 (2004) pp. 3196-3201
[8]	V. Nazmov, E. Reznikova, A. Snigirev, I. Snigireva, J. Mohr, S. Achenbach and V. Saile: "Fabrication and Preliminary Testing of X-Ray Lenses in Thick SU-8 Resist Layers". Microsystem Technologies, Vol. 10, No. 10 (2004) pp. 716-721
[7]	S. Achenbach, F.J. Pantenburg and J. Mohr: "Numerical Simulation of Heating and Thermal Distortions During Exposure in Deep X-Ray Lithography Microstructures". Microsystem Technologies, Vol. 9, No. 3 (2003) pp. 220-224
[6]	S. Achenbach, J. Mohr and F.J. Pantenburg: "Application of Scanning Probe Microscopy for the Determination of the Structural Accuracy of High Aspect Ratio Microstructures". Microelectronic Engineering, Vol. 53 (2000) pp. 637-640
[5]	F.J. Pantenburg, S. Achenbach and J. Mohr: "Characterization of Defects in Very High Deep-Etch X-Ray Lithography Microstructures". Microsystem Technologies, Vol. 4, No. 2 (1998) pp. 89-93
[4]	J. Zanghellini, S. Achenbach, A. El-Kholi, J. Mohr and F.J. Pantenburg: "New Development Strategies for High Aspect Ratio Microstructures". Microsystem Technologies, Vol. 4, No. 2 (1998) pp. 94-97
[3]	F.J. Pantenburg, S. Achenbach and J. Mohr: "Influence of Developer Temperature and Resist Material on the Structure Quality in Deep X-Ray Lithography". Journal of Vacuum Science & Technology, Vol. B 16, No. 6 (1998) pp. 3547-3551
[2]	F. J. Pantenburg, S. Achenbach, M. Börner, J. Mohr, V. Saile: "X-ray beamlines at the microfabrication laboratory at ANKA". Accepted for publication in Nuclear Instruments and Methods
[1]	S. Achenbach, D. Klymyshyn, V. Subramanian, F. Reuther, C. Mullin, G. Wells, V. Nagarkal: "An ultra-large-area Beryllium vacuum window for the X-ray lithography beamline SyLMAND at the Canadian Light Source”. Acceptted for publication in Nuclear Instruments and Methods in Physics Research A (NIMS A)

Conference Publications Copyright Infomation

[20]	D. Yemane, J. Goettert,V. Subramanian, S. Achenbach, V. Singh, G. Wells D. Haluzan: "Heat Load Experiments at CAMD and CLS". Proceedings/Abstracts of the 9th Conference on High Aspect Ratio Micro Structure Technology (HARMST), Hsinchu, Taiwan and Himeji, Japan, June 12-18 (2011) p. 40
[19]	D. M. Klymyshyn, M. Boerner, S. Kissling, D. Haluzan, G.Wells, M. Schaffer, E. Gono-Santosa, S. Aachenbach, P. Meyer, J. Mohr: "Mechanical Planarization with Electropolishing to Improve the Performance of High-Aspect-Ratio RF MEMS Circuits". Proceedings/Abstracts of the 9th Conference on High Aspect Ratio Micro Structure Technology (HARMST), Hsinchu, Taiwan and Himeji, Japan, June 12-18 (2011) p. 119
[18]	J.W. Li, W. Dolton, L. Cheng, V. Subramanian, S. Achenbach, G. Wells, V. Nagarkal, E. Matias: "Mechatronic system design study for the tuneable X-ray intensity chopper at the Synchrotron Laboratory for Micro and Nano Devices". Proceedings/Abstracts of the 9th Conference on High Aspect Ratio Micro Structure Technology (HARMST), Hsinchu, Taiwan and Himeji, Japan, June 12-18 (2011) p. 190
[17]	V. Subramanian, S. Achenbach, W. Dolton, G. Wells, E. Hallin, D. Klymyshyn, M. Augustin: "Machine Protection System for the Stepper Motor Actuated SyLMAND Mirrors". Proceedings/Abstracts of the 10th International Synchrotron Radiation Instrumentation Conference (SRI), Melbourne, Australia, Sept. 27- Oct. 2 (2009)
[16]	D. Haluzan, D. Klymyshyn, M. Börner, S. Achenbach, J. Mohr: "Electrostatically Actuated High Aspect Ratio Test Structures for Mechanical Property Evaluation". Proceedings/Abstracts of the 8th Conference on High Aspect Ratio Micro Structure Technology (HARMST), Saskatoon, Canada, June 25-28 (2009) pp. 169-170
[15]	E. Gono-Santosa, D. Klymyshyn, D. Haluzan, M. Börner, S. Achenbach, J. Mohr: "RF MEMS Inductors Fabricated using deep X-Ray Lithography". Proceedings/Abstracts of the 8th Conference on High Aspect Ratio Micro Structure Technology (HARMST), Saskatoon, Canada, June 25-28 (2009) pp. 197-198
[14]	E. Gono-Santosa, D. Klymyshyn, M. Börner, D. Haluzan, S. Achenbach, J. Mohr: "High Aspect Ratio RF Low-Pass Filter Fabricated using deep X-Ray Lithography". Proceedings/Abstracts of the 8th Conference on High Aspect Ratio Micro Structure Technology (HARMST), Saskatoon, Canada, June 25-28 (2009) pp. 199-200
[13]	S. Achenbach, D. Klymyshyn, V. Subramanian, Venkat, G. Wells: "Development of High Aspect Ratio Polymer-Based Microfabrication in Canada", Proceedings/Abstracts of the the 13th International Conference on Commercialization of Micro- and Nanosystems (COMS 2008), Puerto Vallarta, Mexico, August 31-September 4 (2008)
[12]	V. Nagarkal, C. Mullin, S. Achenbach, V. Subramanian, G. Wells: „Mechanical Design of a Radiatively Cooled Intensity Chopper”, Proceedings/Abstracts of the 5th International Workshop on Mechanical Engineering Design of Synchrotron Radiation Equipment and Instrumentation (MEDSI), Saskatoon, Canada, June 10-13 (2008) p. 105
[11]	K. Mandisloh, S. Achenbach, T. Mappes, T. Rogge and R. Truckenmüller: "Submicron Polymer Flow Cells". Proceedings of the ASME 4th International Conference on Nanochannels, Microchannels and Minichannels (ICNMM 2006), Limerick, Ireland, June 19-21 (2006)
[10]	D. Klymyshyn and S. Achenbach: "Starting LIGA Microfabrication Capabilities in Canada". Proceedings of the 10th International Conference on Commercialization of Micro- and Nanosystems (COMS 2005), Baden-Baden, Germany, August 21-25 (2005) pp. 563-565
[9]	Z. Ma, D. Klymyshyn, S. Achenbach and J. Mohr: "LIGA Cavity Resonator for K-Band Applications". Proceedings of the 2005 International Conference on MEMS, NANO, and Smart Systems (ICMENS 2005), Banff, Alberta, July 24-27 (2005) pp. 106-109
[8]	L. Fang, D. Klymyshyn, A. Dinh, D. Haluzan and S. Achenbach: "Phase Noise Performance Comparison Between LIGA-MEMS and On-Chip CMOS Capacitors for a VCO Application". Proceedings of the IEEE Canadian Conference on Electrical and Computer Engineering (CCECE 2005), Saskatoon, Saskatchewan, May 1-4 (2005) pp. 425-428 [PDF]
[7]	S. Achenbach, T. Mappes, R. Fettig, J. Kando and J. Mohr: "Process Conditions for the Fabrication of Sub-Wavelength Scale Structures by X-Ray Lithography in PMMA Films". SPIE, The International Society for Optical Engineering, Proceedings of Photonics Europe 2004 – Photonic Crystal Materials and Nanostructures, Strasbourg, France, April 26-29 (2004) Vol. 5450, pp. 86-94
[6]	V. Subramanian, D. Klymyshyn, S. Achenbach, A. Kachayev and D. Haluzan: "Opportunities for Micro- and Nanostructures Research and Development Using Synchrotron X-Ray Lithography at the Canadian Light Source". Proceedings of the 9th International Conference on Commercialization of Micro- and Nanosystems (COMS 2004), Edmonton, Alberta, August 29-September 2 (2004) pp. 265-268
[5]	X. Chen, J.N. McMullin, C.J. Haugen, R.G. DeCorby, D.M. Klymyshyn, S. Achenbach and J. Mohr: "Coarse WDM Demultiplexer Fabricated with Deep X-Ray Lithography". SPIE, The International Society for Optical Engineering, Proceedings of Photonics North 2004 – Optical Components and Devices, Ottawa, Ontario, September 27 (2004) Vol. 5577, pp. 312-317
[4]	J. Kando, S. Achenbach, R. Fettig, J. Mohr and U. Wallrabe: "Feasibility Study of the Fabrication of 2D Polymer Photonic Crystals by X-Ray Lithography". Proceedings of the International Forum on MicroNano Integration (MINIT), Potsdam, Springer, Berlin, Germany, December 3-4 (2003) pp. 279
[3]	D. Klymyshyn, V. Subramanian, A. Kachayev, D. Haluzan, Z. Ma, C. Ren, X. Chen, J. McMullin, C. Haugen and S. Achenbach: "MEMS Devices for Telecommunications Using Synchrotron X-Ray Lithography". Proceedings of the 3rd Canadian Workshop on MEMS (CWMEMS 2003), Ottawa, Ontario, August 22 (2003)
[2]	A. Kachayev, D. Klymyshyn, S. Achenbach and V. Saile: "High Vertical Aspect Ratio LIGA Microwave 3-dB Coupler". Proceedings of the 2003 International Conference on MEMS, NANO, and Smart Systems (ICMENS 2003), Banff, Alberta, July 20-23 (2003) pp. 38-43
[1]	S. Megtert, F.J. Pantenburg, S. Achenbach, R. Kupka, J. Mohr and M. Roulliay: "Preliminary Results on the Use of Mirror for LIGA Process". SPIE, The International Society for Optical Engineering, Proceedings of Design, Test, and Microfabrication of MEMS/MOEMs, Paris, France (1999) Vol. 3680

Books / Chapters in Books

[1]	S. Achenbach and D. Klymyshyn: "RF Applications". Advanced Micro and Nanosystems, Vol. 7, “LIGA and Its Applications”, Wiley VCH, Weinheim, Germany (ISBN: 978-3-527-31698-4) (2009) pp. 243-280